Chemistry of Thin Films for Lithography

Project duration options:

  • AIBN Research Internship Program (12 weeks)

Description: Photolithography is the process of manufacturing integrated circuits. Current technologies for manufacture are approaching a limit, determined by the limits to the size of the features needed to be printed onto silicon wafers. New approaches are needed and one of these is assembly of polymer guided by the surface chemistry of a film. This project aims to change the surface energy of a photo-reactive film by exposing to UV light, and treating with a chemical capable of binding to the new chemical units so formed. The project will involve working with a PhD student on preparation, exposure and characterisation of thin films. The emphasis of the project will be on understanding how the changes in chemistry affect the surface properties.

Expected outcomes and deliverables: The student will learn about the novel field call chemo-epitaxy, i.e. directing the alignment of polymers through changes in surface energy. The project will involve training in materials preparation and analysis.

Applicant requirements: This project is open to applications from students with a background in chemistry, or chemical engineering.

Primary supervisor: Professor Andrew Whittaker Email: