Md Mahbub Alam's research focuses on understanding and Controlling the Structure of Thin Polymer Films used in Photolithography
Line edge roughness (LER) is an increasingly important problem in semiconductor industries as the device size continues to move towards smaller critical dimensions (CD). Compositional heterogeneity of the resist materials in the pattern’s line edge regions is one of the many reasons that affect the resist roughness. Mr. Mahbub is working on the synthesis of a novel kind of copolymers named Gradient Copolymer which has very distinguished structure and properties than those of conventional block and statistical copolymers. The aim of Mr. Mahbub's project is to study the thin film properties of the gradient copolymers and compare them to the conventional copolymers and therefore to establish a relationship between the copolymer structure to LER in photolithography.
Mr. Mahbub is a PhD candidate at the Australian Inistitute for Bioengineering and Nanotechnology (AIBN), UQ. He did his MS from Kookmin University, South Korea majoring in Advance Materials Engineering and did his Bachelor from University of Dhaka, Bangladesh majoring in Chemistry. Before joining in his PhD, Mr. Mahbub was a lecturer of Chemistry in Ahsanullah University of Science and Technology.
Key Publications
Reactivity ratios and sequence distribution characterization by quantitative 13C NMR for RAFT synthesis of styrene-acrylonitrile (SA) copolymers, Journal of Polymer Science Part A: Polymer Chemistry (In press).
Au nanopatterns on glass substrate using block copolymer and their applications in transparent conducting electrode, Thin Solid Films, 520 (2012) 5161–5164.
Fabrication of 2D photonic crystals using block copolymer patterns on as grown LEDs, Journal of Colloid and Interface Science, 363 (2011) 446–449.
Fabrication of nanopatterns using block copolymer and controlling surface morphology, Journal of Colloid and Interface Science, 348 (2010) 206-210.
Size tunable nano patterns using Nanosphere Lithography with ashing and annealing effect, Korean Journal of Material Research, Vol. 20, No. 10, (2010) 550-554.