My past research interest includes advanced lithography material and process, nanoscale electronics, and integrated circuit.

Dr Elliot Cheng obtained his PhD from the MacDiarmid Institute for Advanced Materials and Nanotechnology, Department of Electrical and Electronic Engineering, University of Canterbury (New Zealand) in 2009. During 2009–2012, he worked at The University of Queensland as a postdoctoral researcher on a collaborative project between a team of researchers from UQ and Intel Corp., Hillsboro, USA, on developing directed-self-assembly (DSA) processes for extreme ultraviolet lithography (EUVL) for 22 nm transistor fabrication. Elliot specialises in electron beam lithography (EBL) and next generation lithography for transistor manufacture. Elliot has a vast knowledge of nano and microfabrication and characterisation techniques such as UV lithography, two-photon lithography, focused ion beam lithography, electron and scanning probe microscopy.

Industry Engagement

Postdoc fellowing worked on a UQ linkage project Intel Corp. 
Assisted in process development for UQ linkage projects with Sematech and Dow Chemical for advanced lithography materials

Key Publications

Chuang, Ya-Mi, Jack, Kevin S., Cheng, Han-Hao, Whittaker, Andrew K. and Blakey, Idriss (2012) Using directed self assembly of block copolymer nanostructures to modulate nanoscale surface roughness: towards a novel lithographic process. Advanced Functional Materials, 23 2: 173-183. doi:10.1002/adfm.201200564

Keen, Imelda, Yu, Anguang, Cheng, Han-Hao, Jack, Kevin S., Nicholson, Timothy, Whittaker, Andrew K. and Blakey, Idriss (2012) Control of the orientation of symmetric poly(styrene)-block-poly(D,L-lactide) block copolymers using statistical copolymers of dissimilar composition. Langmuir, 28 45: 15876-15888. doi:10.1021/la304141m

Wu, Kuang-Hsu, Cheng, Han-Hao, Mohammad, Ali Amdad, Blakey, Idriss, Jack, Kevin, Gentle, Ian R. and Wang, Da-Wei (2015) Electron-beam writing of deoxygenated micro-patterns on graphene oxide film. Carbon, 95 738-745. doi:10.1016/j.carbon.2015.08.116

Cheng, Han-Hao, Yu, Anguang, Keen, Imelda, Chuang, Yami, Jack, Kevin S., Leeson, Michael J., Younkin, Todd R., Blakey, Idriss and Whittaker, Andrew K. (2012) Electron-beam induced freezing of an aromatic based EUV resist: a robust template for directed self assembly of block copolymers. IEEE Transactions on Nanotechnology, 11 6: 1140-1147. doi:10.1109/TNANO.2012.2216544

Lawrie, Kirsten J., Blakey, Idriss, Blinco, James P., Cheng, Han Hao, Gronheid, Roel, Jack, Kevin S., Pollentier, Ivan, Leesion, Michael J., Younkin, Todd R. and Whittaker, Andrew K. (2011) Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers. Journal of Materials Chemistry, 21 15: 5629-5637. doi:10.1039/c0jm03288c

See full list of publications on espace